marx engineering halbleitertechnik
Extreme ultraviolet lithography – the technology of tomorrow


EUV (extreme ultraviolet) lithography is a photolithography process which uses light with a wavelength of 13.5 nm (EUV light). 
This low wavelength makes it possible to push structure miniaturisation in the semiconductor industry one step further and in doing so create even smaller and more efficient circuits.

Over the course of the last decade, we have been very active, in cooperation with our customers, in developing new EUV sources and pushing the evolution of existing ones forwards. 
Our focuses in this area are on processes within the environment around the light source, such as vacuums, cooling, heating, gas supply and controlling the high voltage. In this context, the main tasks relate to creating the system architecture, the electrical design, the control system and optimising the processes involved.

Thanks to our many years of experience, our strengths include clean room, vacuum and laser technologies.

 

Contact

1704 Marx Sascha Schommers Engineering
Sascha Schommers

Leader Engineering

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+49 2428 81400-0

Marx Automation GmbH
Im Kohnental 11
52353 Düren

+49 2428 81400 - 0
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