Extreme ultraviolet lithography – the technology of tomorrow
EUV (extreme ultraviolet) lithography is a photolithography process which uses light with a wavelength of 13.5 nm (EUV light).
This low wavelength makes it possible to push structure miniaturisation in the semiconductor industry one step further and in doing so create even smaller and more efficient circuits.
Over the course of the last decade, we have been very active, in cooperation with our customers, in developing new EUV sources and pushing the evolution of existing ones forwards.
Our focuses in this area are on processes within the environment around the light source, such as vacuums, cooling, heating, gas supply and controlling the high voltage. In this context, the main tasks relate to creating the system architecture, the electrical design, the control system and optimising the processes involved.
Thanks to our many years of experience, our strengths include clean room, vacuum and laser technologies.
